2002 academic year

Prediction of Electromigration Failure in Passivated Polycrystalline Lines in IC [Proc. JSME M & M 2003 Spring Symposium, No.03-06, Tokyo/Tokyo Institute of Technology, (2003-3/28~29), 7-10]
K. Sasagawa, M. Hasegawa, M. Saka and H. Abe



Failure Simulation of Angled Polycrystalline Lines Covered With Passivation Layer [Proc. 2002 ASME International Mechanical Engineering Congress & Exposition(CD-ROM), ASME, New Orleans, USA, (2002-11/17~22), Paper ID: IMECE2002-39677]
M. Hasegawa, K. Sasagawa, M. Saka and H. Abe



Prediction Method of Electromigration Failure in Passivated Polycrystalline Line [Proc. International Symposium of Precision Engineering and MEMS' 2002, (2002-11/3-6), Hangzhou, China, 14-20]
K. Sasagawa, M. Hasegawa, M. Saka and H. Abe(presented by Prof. Saka)



Prediction of Electromigration Failure Considering Passivation Thickness [Proc. the 15th Computational Mechanics Conference, No.02-02, Kagoshima/Kagoshima University, (2002-11/2~4), 319-320]
K. Sasagawa, N. Yoshida, M. Hasegawa, M. Saka and H. Abe



Derivation of Film Characteristics and Prediction of Electromigration Failure in Passivated Polycrystalline Line [Advanced Metalization Conference 2002, (2002-10/28-30), MRS, 291-296]
K. Sasagawa, M. Hasegawa, M. Saka and H. Abe



Prediction of failure in the angled polycrystalline lines covered with passivation [Proc. 2002 JSME Annual Meeting (VI),No.02-1, Tokyo/The University of Tokyo, (2002-9/24~28), 263-264
M. Hasegawa, K. Sasagawa, M. Saka and H. Abe



Prediction of Electromigration Failure in Angled and Passivated Polycrystalline Line [Proc. 46th Material Research Conference, Kyoto/Kyodaikaikan, (2002-9/18~19), 343-344]
M. Hasegawa, K. Sasagawa, M. Saka and H. Abe



Simulation of Electromigration Failure in Angled Polycrystalline Line Covered with Passivation Layer [Advances in Computational Engineering & Sciences, Proc. 2002 International Conference for Computational Engineering and Sciences(CD-ROM), Reno, USA, (2002-7/31~8/2), Paper ID: 86]
M. Hasegawa, K. Sasagawa, M. Saka and H. Abe



Prediction of Electromigration Failure in Passivated Polycrystalline Line [Journal of Applied Physics, 91(11), (2002-6/1), 9005-9014]
K. Sasagawa, M. Hasegawa, M. Saka and H. Abe



Prediction of Electromigration Failure in Angled Passivated Polycrystalline Line [Proc. 2002 JSMS Conference, Kagawa, (2002-5/22~24), 315-316]
M. Hasegawa, K. Sasagawa, M. Saka and H. Abe