2001 academic year

Governing Parameter for Electromigration Damage in the Polycrystalline Line Covered with Passivation Layer [Journal of Applied Physics, 91(4), (2002-2/15), 1882-1890]
K. Sasagawa, M. Hasegawa, M. Saka and H. Abe



Prediction of Electromigration Failure in Passivated Polycrystalline Line by Using Governing Parameter of Electromigration Damage [Proc. the 14th Computational Mechanics Conference, (2001-11), 483-484]
K. Sasagawa, M. Hasegawa, M. Saka and H. Abe



Effects of Corner Position and Operating Condition on Electromigration Failure in Angled Bamboo Lines without Passivation Layer [Thin Solid Films, 401(1-2), (2001-12/17), 255-266]
K. Sasagawa, M. Hasegawa, K. Naito, M. Saka and H. Abe



A Governing Parameter for Electromigration Damage in Passivated Polycrystalline Lines and Its Verification [Stress-Induced Phenomena in Metallization: Proc. Sixth International Workshop, edited by S.P. Baker et al, AIP, Cornell University, Ithaka, USA, July 25~27, 2001, (2002), 74-85]
K. Sasagawa, M. Hasegawa, M. Saka and H. Abe



Verification of the Governing Parameter for Electromigration Damage in Polycrystalline Line with Passivation Layer [Proc. the 2001 Annual Meeting of JSME/MMD, (2001-8), 537-538]
K. Sasagawa, M. Hasegawa, M. Saka and H. Abe



A Governing Parameter for Electromigration Damage in Passivated Polycrystalline Line and Its Verification [Proc. 7th Conf. Atomic Transportation and Stress Problem in LSI Metallization, (2001-7), 17-18]
K. Sasagawa, M. Hasegawa, M. Saka and H. Abe



Verification of the Governing Parameter for Electromigration Damage in Passivated Polycrystalline Line [Proc. of InterPACK '01(CD-ROM), The Pacific Rim/International, Intersociety, Electronic Packaging Technical/Business Conference & Exhibition, ASME, Kauai, Hawaii, USA, July 8~13, 2001, (2001-7/9), IPACK2001-15644, 1-9]
K. Sasagawa, M. Hasegawa, M. Saka and H. Abe



A Governing Parameter for Electromigration Damage and Prediction of Failure in Al Lines [Proc. of Int. Symposia on Material Science for the 21st Century, Osaka, Japan, (2001-5/21), 245-248]
K. Sasagawa, K. Naito, M. Hasegawa, M. Saka and H. Abe